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Doping of GaN grown on silicon via ion implantation:
, In:
2019 19th International Workshop on Junction Technology (IWJT)
,
Mazen, Frederic
;
Coig, Marianne
;
Lardeau-Falcy, Aurelien
... - p. 1-5 , 2019
Link:
https://doi.org/10.23919/IWJT.2019.8802889
RT T1
2019 19th International Workshop on Junction Technology (IWJT)
: T1
Doping of GaN grown on silicon via ion implantation
UL https://suche.suub.uni-bremen.de/peid=ieee-8802889&Exemplar=1&LAN=DE A1 Mazen, Frederic A1 Coig, Marianne A1 Lardeau-Falcy, Aurelien A1 Amichi, Lynda A1 Veillerot, Marc A1 Licitra, C. A1 Grenier, Adeline A1 Biscarrat, Jerome A1 Kanyandekwe, Joel A1 Charles, Matthew A1 Milesi, Frederic YR 2019 K1 Gallium nitride K1 Silicon K1 Doping K1 Rapid thermal annealing K1 HEMTs K1 Ion implantation SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.23919/IWJT.2019.8802889 DO https://doi.org/10.23919/IWJT.2019.8802889 SF ELIB - SuUB Bremen
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