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1 Ergebnisse
1
The First GeSn Gate-All-Around Nanowire P-FET on the GeSnOI..:
, In:
2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)
,
Kang, Yuye
;
Han, Kaizhen
;
Kong, Eugene Y.-J.
... - p. 1-2 , 2019
Link:
https://doi.org/10.1109/VLSI-TSA.2019.8804647
RT T1
2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)
: T1
The First GeSn Gate-All-Around Nanowire P-FET on the GeSnOI Substrate with Channel Length of 20 nm and Subthreshold Swing of 74 mV/decade
UL https://suche.suub.uni-bremen.de/peid=ieee-8804647&Exemplar=1&LAN=DE A1 Kang, Yuye A1 Han, Kaizhen A1 Kong, Eugene Y.-J. A1 Lei, Dian A1 Xu, Shengqiang A1 Wu, Ying A1 Huang, Yi-Chiau A1 Gong, Xiao YR 2019 K1 Substrates K1 Logic gates K1 Gallium arsenide K1 Silicon K1 Germanium K1 Nanoscale devices SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA.2019.8804647 DO https://doi.org/10.1109/VLSI-TSA.2019.8804647 SF ELIB - SuUB Bremen
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