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A new wet etching method for black phosphorus layer number ..:

, In: 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Liu, Teren ; Fang, Tao ; Kavanagh, Karen.. - p. 1-3 , 2019
Link: https://doi.org/10.1109/SISPAD.2019.8870363