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Defect Evaluation of O2-annealed TaOx for Transparent ReRAM..:

, In: 2019 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK),
Doko, Soshun ; Suda, Yoriko ; Ishii, Yoshiaki. - p. 75-76 , 2019
Link: https://doi.org/10.1109/IMFEDK48381.2019.8950706