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1 Ergebnisse
1
Atomic Layer Deposited AlxNiyO as Hole Selective Contact fo..:
, In:
2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)
,
Zhang, Tian
;
Hossain, Md. Anower
;
Thong Khoo, Kean
... - p. 2338-2341 , 2019
Link:
https://doi.org/10.1109/PVSC40753.2019.8980522
RT T1
2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)
: T1
Atomic Layer Deposited AlxNiyO as Hole Selective Contact for Silicon Solar Cells
UL https://suche.suub.uni-bremen.de/peid=ieee-8980522&Exemplar=1&LAN=DE A1 Zhang, Tian A1 Hossain, Md. Anower A1 Thong Khoo, Kean A1 Lee, Chang-Yeh A1 Zakaria, Yahya A1 Abdallah, Amir A A1 Hoex, Bram YR 2019 K1 atomic layer deposition K1 hole selective contact K1 photovoltaic cells K1 silicon SP 2338 OP 2341 LK http://dx.doi.org/https://doi.org/10.1109/PVSC40753.2019.8980522 DO https://doi.org/10.1109/PVSC40753.2019.8980522 SF ELIB - SuUB Bremen
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