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Evaluation of ITO/a-Si Interface Fabricated by RPD Techniqu:
, In:
2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)
,
Nishihara, Tappei
;
Kamioka, Takefumi
;
Kanai, Hiroki
... - p. 2702-2704 , 2019
Link:
https://doi.org/10.1109/PVSC40753.2019.8980657
RT T1 <cTitle>2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)</cTitle>: T1 <Title>Evaluation of ITO/a-Si Interface Fabricated by RPD Technique</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-8980657&Exemplar=1&LAN=DE A1 Nishihara, Tappei A1 Kamioka, Takefumi A1 Kanai, Hiroki A1 Ohshita, Yoshio A1 Matsumura, Hideki A1 Yasuno, Satoshi A1 Hirosawa, Ichiro A1 Ogura, Atsushi YR 2019 K1 photovoltaic cells K1 silico K1 Annealing K1 Indium tin oxide K1 spectroscopy SP 2702 OP 2704 LK http://dx.doi.org/https://doi.org/10.1109/PVSC40753.2019.8980657 DO https://doi.org/10.1109/PVSC40753.2019.8980657 SF ELIB - SuUB Bremen
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