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1 Ergebnisse
1
14nm FinFET process technology platform for over 100M pixel..:
, In:
2019 IEEE International Electron Devices Meeting (IEDM)
,
Yu, Donghee
;
Choi, Jong-Won
;
Jung, Sangil
... - p. 8.1.1-8.1.4 , 2019
Link:
https://doi.org/10.1109/IEDM19573.2019.8993567
RT T1 <cTitle>2019 IEEE International Electron Devices Meeting (IEDM)</cTitle>: T1 <Title>14nm FinFET process technology platform for over 100M pixel density and ultra low power 3D Stack CMOS Image Sensor</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-8993567&Exemplar=1&LAN=DE A1 Yu, Donghee A1 Choi, Jong-Won A1 Jung, Sangil A1 Kwon, Minho A1 Ha, Il-Seon A1 Kim, Chaesung A1 Cho, Sanghyun A1 Lim, Seunghyun A1 Kim, Won-Woong A1 Kim, Moo-Young A1 Park, Seonghye A1 Lee, Choong jae A1 Lee, Ki-Don A1 Ranjan, Rakesh A1 Maeda, Shigenobu A1 Jeong, Gitae A1 Park, Myounkyu A1 Park, Junghwan A1 Hwang, Seungju A1 Lee, Joonhyung A1 Yu, Sunghun A1 Shin, Hyunjung A1 Kim, ByoungHo YR 2019 SN 2156-017X K1 CMOS Image Sensor K1 FinFET K1 3D Stack CIS SP 8.1.1 OP 8.1.4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM19573.2019.8993567 DO https://doi.org/10.1109/IEDM19573.2019.8993567 SF ELIB - SuUB Bremen
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