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1
Application of In-situ Pre-epi Clean Process for Next Gener..:
, In:
2019 16th China International Forum on Solid State Lighting & 2019 International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)
,
Waugh, Darian
;
Chen, Gim
;
Boecker, Jennifer
. - p. 14-17 , 2019
Link:
https://doi.org/10.1109/SSLChinaIFWS49075.2019.9019762
RT T1 <cTitle>2019 16th China International Forum on Solid State Lighting & 2019 International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)</cTitle>: T1 <Title>Application of In-situ Pre-epi Clean Process for Next Generation Semiconductor Devices</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9019762&Exemplar=1&LAN=DE A1 Waugh, Darian A1 Chen, Gim A1 Boecker, Jennifer A1 Kashkoush, Ismail YR 2019 K1 Silicon K1 Surface treatment K1 Epitaxial growth K1 Cleaning K1 Silicon carbide K1 Gallium nitride K1 Hafnium SP 14 OP 17 LK http://dx.doi.org/https://doi.org/10.1109/SSLChinaIFWS49075.2019.9019762 DO https://doi.org/10.1109/SSLChinaIFWS49075.2019.9019762 SF ELIB - SuUB Bremen
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