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1 Ergebnisse
1
Extraction of Ultra-Low Contact Resistivity by End-Resistan..:
, In:
2020 IEEE 33rd International Conference on Microelectronic Test Structures (ICMTS)
,
Tsui, Bing-Yue
;
Lee, Ya-Hsin
;
Wu, Dong-Ying
.. - p. 1-5 , 2020
Link:
https://doi.org/10.1109/ICMTS48187.2020.9107910
RT T1 <cTitle>2020 IEEE 33rd International Conference on Microelectronic Test Structures (ICMTS)</cTitle>: T1 <Title>Extraction of Ultra-Low Contact Resistivity by End-Resistance Method</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9107910&Exemplar=1&LAN=DE A1 Tsui, Bing-Yue A1 Lee, Ya-Hsin A1 Wu, Dong-Ying A1 Lee, Yao-Jen A1 Li, Mei-Yi YR 2020 SN 2158-1029 SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ICMTS48187.2020.9107910 DO https://doi.org/10.1109/ICMTS48187.2020.9107910 SF ELIB - SuUB Bremen
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