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1 Ergebnisse
1
Reliability of Ferroelectric HfO2-based Memories: From MOS ..:
, In:
2020 Device Research Conference (DRC)
,
Tan, Ava J.
;
Wang, Li-Chen
;
Liao, Yu-Hung
... - p. 1-2 , 2020
Link:
https://doi.org/10.1109/DRC50226.2020.9135148
RT T1
2020 Device Research Conference (DRC)
: T1
Reliability of Ferroelectric HfO2-based Memories: From MOS Capacitor to FeFET
UL https://suche.suub.uni-bremen.de/peid=ieee-9135148&Exemplar=1&LAN=DE A1 Tan, Ava J. A1 Wang, Li-Chen A1 Liao, Yu-Hung A1 Bae, Jong-Ho A1 Hu, Chenming A1 Salahuddin, Sayeef YR 2020 SN 2640-6853 SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/DRC50226.2020.9135148 DO https://doi.org/10.1109/DRC50226.2020.9135148 SF ELIB - SuUB Bremen
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