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1 Ergebnisse
1
Control of Wafer Scanners: Methods and Developments:
, In:
2020 American Control Conference (ACC)
,
Heertjes, M.F.
;
Butler, H.
;
Dirkx, N.J.
... - p. 3686-3703 , 2020
Link:
https://doi.org/10.23919/ACC45564.2020.9147464
RT T1
2020 American Control Conference (ACC)
: T1
Control of Wafer Scanners: Methods and Developments
UL https://suche.suub.uni-bremen.de/peid=ieee-9147464&Exemplar=1&LAN=DE A1 Heertjes, M.F. A1 Butler, H. A1 Dirkx, N.J. A1 van der Meulen, S.H. A1 Ahlawat, R. A1 O'Brien, K. A1 Simonelli, J. A1 Teng, K-T. A1 Zhao, Y. YR 2020 SN 2378-5861 K1 Ultraviolet sources K1 Wavelength measurement K1 Gratings K1 Lithography K1 Integrated circuits K1 advanced motion control K1 feedback/feedforward control K1 light source K1 nano-precision mechatronics K1 observer design K1 thermal control K1 vibration isolation & control K1 wafer scanners K1 wavelength control SP 3686 OP 3703 LK http://dx.doi.org/https://doi.org/10.23919/ACC45564.2020.9147464 DO https://doi.org/10.23919/ACC45564.2020.9147464 SF ELIB - SuUB Bremen
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