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1 Ergebnisse
1
Middle of Line: Challenges and Their Resolution for FinFET ..:
, In:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Mishra, Shiv Kumar
;
Geiss, Erik
;
Kumar, Aditya
... - p. 1-5 , 2020
Link:
https://doi.org/10.1109/ASMC49169.2020.9185205
RT T1 <cTitle>2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Middle of Line: Challenges and Their Resolution for FinFET Technology</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9185205&Exemplar=1&LAN=DE A1 Mishra, Shiv Kumar A1 Geiss, Erik A1 Kumar, Aditya A1 Malinowski, Arkadiusz A1 Zhi, Gao Wen A1 Lin, Wenhe A1 Indajang, Bangun A1 Slisher, Dustin YR 2020 SN 2376-6697 K1 Contact resistance K1 Annealing K1 Tin K1 FinFETs K1 Performance evaluation K1 Logic gates K1 Silicides K1 CMOS K1 FinFET K1 Middle of Line (MOL) K1 Replacement metal Gate (RMG) K1 Scaling K1 Overlay K1 Moore's Law SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC49169.2020.9185205 DO https://doi.org/10.1109/ASMC49169.2020.9185205 SF ELIB - SuUB Bremen
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