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1 Ergebnisse
1
In-line Photoresist Defect Reduction through Failure Mode a..:
, In:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Goswami, S.
;
Hall, S.
;
Wyko, W.
... - p. 1-5 , 2020
Link:
https://doi.org/10.1109/ASMC49169.2020.9185269
RT T1
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
In-line Photoresist Defect Reduction through Failure Mode and Root-Cause Analysis:Topics/categories: EO (Equipment Optimization)/ DR (Defect Reduction)
UL https://suche.suub.uni-bremen.de/peid=ieee-9185269&Exemplar=1&LAN=DE A1 Goswami, S. A1 Hall, S. A1 Wyko, W. A1 Elson, J.T A1 Galea, J. A1 Kretchmer, J. YR 2020 SN 2376-6697 K1 Resists K1 Solvents K1 Optical filters K1 Inspection K1 Chemicals K1 Lithography K1 Media K1 Defect reduction K1 photolithography K1 spin-coating K1 failure mode K1 root cause Analysis K1 photoresistfilter SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC49169.2020.9185269 DO https://doi.org/10.1109/ASMC49169.2020.9185269 SF ELIB - SuUB Bremen
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