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Impact of Process Chambers Exhaust on Wafer Defectivity in ..:
, In:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Matam, Kedari
;
Peethala, Brown
;
Taff, Charles
... - p. 1-4 , 2020
Link:
https://doi.org/10.1109/ASMC49169.2020.9185285
RT T1 <cTitle>2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Impact of Process Chambers Exhaust on Wafer Defectivity in Wet Clean tools</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9185285&Exemplar=1&LAN=DE A1 Matam, Kedari A1 Peethala, Brown A1 Taff, Charles A1 Gardner, Zachary A1 Yang, Chung Ju A1 Muthumanickam, Sankar A1 Sil, Devika YR 2020 SN 2376-6697 K1 Tools K1 Cleaning K1 Ducts K1 Atmospheric measurements K1 Particle measurements K1 Monitoring K1 Chemicals K1 Exhaust K1 Crystallization K1 Condensation Exhaust velocity K1 Particle performance K1 Auto chamber clean (ACC) K1 Sulfuric peroxide mixture (SPM) K1 Standard Clean 1 (SC1) K1 Standard Clean 2 (SC2) SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC49169.2020.9185285 DO https://doi.org/10.1109/ASMC49169.2020.9185285 SF ELIB - SuUB Bremen
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