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1 Ergebnisse
1
Particle Defect Reduction Through YF3 Coated Remote Plasma ..:
, In:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Seo, Hyojeong
;
Yang, Jeonghye
;
Ma, Young Jae
... - p. 1-5 , 2020
Link:
https://doi.org/10.1109/ASMC49169.2020.9185300
RT T1
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Particle Defect Reduction Through YF3 Coated Remote Plasma Source for High Throughput Dry Cleaning Process
UL https://suche.suub.uni-bremen.de/peid=ieee-9185300&Exemplar=1&LAN=DE A1 Seo, Hyojeong A1 Yang, Jeonghye A1 Ma, Young Jae A1 Park, Jongwoo A1 Kim, Mi Kyoung A1 Seo, David H. A1 Yoon, Sung Jin A1 Park, Sang Jong YR 2020 SN 2376-6697 K1 Inductors K1 Plasmas K1 Coatings K1 Surface treatment K1 Rough surfaces K1 Surface roughness K1 Iterative closest point algorithm K1 dry clean K1 inductive coupling K1 YF3 coating K1 NF3 K1 remote plasma K1 particle defects SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC49169.2020.9185300 DO https://doi.org/10.1109/ASMC49169.2020.9185300 SF ELIB - SuUB Bremen
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