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1 Ergebnisse
1
Tilt angle and dose rate monitoring of low energy ion impla..:
, In:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Pongracz, A.
;
Szivos, J.
;
Ujhelyi, F.
... - p. 1-4 , 2020
Link:
https://doi.org/10.1109/ASMC49169.2020.9185326
RT T1
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Tilt angle and dose rate monitoring of low energy ion implantation processes with photomodulated reflectance measurement : AM: Advanced Metrology
UL https://suche.suub.uni-bremen.de/peid=ieee-9185326&Exemplar=1&LAN=DE A1 Pongracz, A. A1 Szivos, J. A1 Ujhelyi, F. A1 Zolnai, Zs. A1 Sepsi, O. A1 Kun, a. A1 Nadudvari, Gy. A1 Byrnes, J. A1 Rubin, Leonard M. A1 Moore, Edward D. YR 2020 SN 2376-6697 K1 Implants K1 Ion implantation K1 Sensitivity K1 Reflectivity K1 Measurement by laser beam K1 Ions K1 Ion beams SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC49169.2020.9185326 DO https://doi.org/10.1109/ASMC49169.2020.9185326 SF ELIB - SuUB Bremen
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