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98% Endurance Error Reduction by Hard_Verify for 40nm TaOx ..:

, In: 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA),
Yonai, Tsubasa ; Kinoshita, Hiroshi ; Yasuhara, Ryutaro. - p. 35-36 , 2020
Link: https://doi.org/10.1109/VLSI-TSA48913.2020.9203572