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Investigation of the Impact of Internal Metal Gate – From M..:

, In: 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA),
Lee, Shen-Yang ; Chen, Han-Wei ; Chung, Chun-Chih... - p. 124-125 , 2020
Link: https://doi.org/10.1109/VLSI-TSA48913.2020.9203642