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1 Ergebnisse
1
600 meV Effective Work Function Tuning by Sputtered WNx Fil..:
, In:
2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)
,
Tsai, Chung-En
;
Huang, Chih-Hsiung
;
Chen, Yu-Rui
... - p. 106-107 , 2020
Link:
https://doi.org/10.1109/VLSI-TSA48913.2020.9203742
RT T1 <cTitle>2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)</cTitle>: T1 <Title>600 meV Effective Work Function Tuning by Sputtered WNx Films</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9203742&Exemplar=1&LAN=DE A1 Tsai, Chung-En A1 Huang, Chih-Hsiung A1 Chen, Yu-Rui A1 Tu, Chien-Te A1 Huang, Yu-Shiang A1 Liu, C. W. YR 2020 K1 Films K1 Annealing K1 Etching K1 Oxidation K1 Metals K1 Nitrogen K1 Logic gates SP 106 OP 107 LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA48913.2020.9203742 DO https://doi.org/10.1109/VLSI-TSA48913.2020.9203742 SF ELIB - SuUB Bremen
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