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Mathematical Modelling of Magnetron Sputtering Process Duri..:
, In:
2020 International Russian Automation Conference (RusAutoCon)
,
Malyukov, S. P.
;
Sayenko, A. V.
;
Zinovev, S. S.
- p. 368-373 , 2020
Link:
https://doi.org/10.1109/RusAutoCon49822.2020.9208191
RT T1 <cTitle>2020 International Russian Automation Conference (RusAutoCon)</cTitle>: T1 <Title>Mathematical Modelling of Magnetron Sputtering Process During Thin Films Formation</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9208191&Exemplar=1&LAN=DE A1 Malyukov, S. P. A1 Sayenko, A. V. A1 Zinovev, S. S. YR 2020 K1 Sputtering K1 Mathematical model K1 Magnetic films K1 Magnetic recording K1 Trajectory K1 Magnetic fields K1 Space charge K1 magnetron sputtering K1 mathematical modelling K1 particle movement K1 thin films SP 368 OP 373 LK http://dx.doi.org/https://doi.org/10.1109/RusAutoCon49822.2020.9208191 DO https://doi.org/10.1109/RusAutoCon49822.2020.9208191 SF ELIB - SuUB Bremen
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