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Implant heating contribution to amorphous layer formation: ..:

, In: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Julliard, P.L. ; Dumas, P. ; Monsieur, F.... - p. 43-46 , 2020
Link: https://doi.org/10.23919/SISPAD49475.2020.9241608