I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Application of Noise to Avoid Overfitting in TCAD Augmented..:
, In:
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
,
Raju, Sophia Susan
;
Wang, Boyan
;
Mehta, Kashyap
... - p. 351-354 , 2020
Link:
https://doi.org/10.23919/SISPAD49475.2020.9241654
RT T1
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
: T1
Application of Noise to Avoid Overfitting in TCAD Augmented Machine Learning
UL https://suche.suub.uni-bremen.de/peid=ieee-9241654&Exemplar=1&LAN=DE A1 Raju, Sophia Susan A1 Wang, Boyan A1 Mehta, Kashyap A1 Xiao, Ming A1 Zhang, Yuhao A1 Wong, Hiu-Yung YR 2020 SN 1946-1577 K1 Temperature measurement K1 Schottky diodes K1 Semiconductor device measurement K1 Machine learning K1 Silicon K1 Semiconductor process modeling K1 P-i-n diodes K1 Gallium Oxide K1 Machine Learning K1 Noise K1 Schottky Barrier Diode K1 TCAD SP 351 OP 354 LK http://dx.doi.org/https://doi.org/10.23919/SISPAD49475.2020.9241654 DO https://doi.org/10.23919/SISPAD49475.2020.9241654 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)