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Deposition of Optically Transparent Copper Films on Dielect..:
, In:
2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE)
,
Kolokoltsev, Vyacheslav
;
Borovitskaya, Irina
;
Nikulin, Valerii
... - p. 971-974 , 2020
Link:
https://doi.org/10.1109/EFRE47760.2020.9242168
RT T1
2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE)
: T1
Deposition of Optically Transparent Copper Films on Dielectric Substrates Using the Plasma Focus Installation
UL https://suche.suub.uni-bremen.de/peid=ieee-9242168&Exemplar=1&LAN=DE A1 Kolokoltsev, Vyacheslav A1 Borovitskaya, Irina A1 Nikulin, Valerii A1 Silin, Pavel A1 Bondarenko, Gennadii A1 Degtyarev, Vladimir YR 2020 K1 Temperature measurement K1 Glass K1 Plasmas K1 Copper K1 Optical scattering K1 Optical films K1 Optical pulses K1 plasma focus K1 "metal" plasma K1 copper films K1 transmission spectrum K1 adhesion SP 971 OP 974 LK http://dx.doi.org/https://doi.org/10.1109/EFRE47760.2020.9242168 DO https://doi.org/10.1109/EFRE47760.2020.9242168 SF ELIB - SuUB Bremen
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