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1 Ergebnisse
1
Record Low Contact Resistivity to Ge:B $(8.1\mathrm{x}10^{-..:
, In:
2020 IEEE Symposium on VLSI Technology
,
Lu, Fang-Liang
;
Liu, Yi-Chun
;
Tsai, Chung-En
.. - p. 1-2 , 2020
Link:
https://doi.org/10.1109/VLSITechnology18217.2020.92650..
RT T1
2020 IEEE Symposium on VLSI Technology
: T1
Record Low Contact Resistivity to Ge:B $(8.1\mathrm{x}10^{-10}\Omega-\mathrm{cm}^{2})$ and GeSn:B $(4.1\mathrm{x}10^{-10}\Omega-\mathrm{cm}^{2})$ with Optimized [B] and [Sn] by In-situ CVD Doping
UL https://suche.suub.uni-bremen.de/peid=ieee-9265009&Exemplar=1&LAN=DE A1 Lu, Fang-Liang A1 Liu, Yi-Chun A1 Tsai, Chung-En A1 Ye, Hung-Yu A1 Liu, C. W. YR 2020 SN 2158-9682 K1 Germanium K1 Metals K1 Thermal stability K1 Epitaxial growth K1 Very large scale integration K1 Conductivity K1 Stability analysis SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnology18217.2020.9265009 DO https://doi.org/10.1109/VLSITechnology18217.2020.9265009 SF ELIB - SuUB Bremen
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