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1 Ergebnisse
1
Surrounding Gate Vertical-Channel FET with Gate Length of 4..:
, In:
2020 IEEE Symposium on VLSI Technology
,
Fujiwara, Hirokazu
;
Sato, Yuta
;
Saito, Nobuyoshi
.. - p. 1-2 , 2020
Link:
https://doi.org/10.1109/VLSITechnology18217.2020.92651..
RT T1
2020 IEEE Symposium on VLSI Technology
: T1
Surrounding Gate Vertical-Channel FET with Gate Length of 40 nm Using BEOL Compatible High-Thermal-Tolerance In-Al-Zn Oxide Channel
UL https://suche.suub.uni-bremen.de/peid=ieee-9265109&Exemplar=1&LAN=DE A1 Fujiwara, Hirokazu A1 Sato, Yuta A1 Saito, Nobuyoshi A1 Ueda, Tomomasa A1 Ikeda, Keiji YR 2020 SN 2158-9682 K1 Field effect transistors K1 Logic gates K1 Thermal stability K1 Annealing K1 Stress K1 Electrodes K1 Threshold voltage K1 oxide semiconductor K1 thermal stability K1 mobility K1 BEOL Tr SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnology18217.2020.9265109 DO https://doi.org/10.1109/VLSITechnology18217.2020.9265109 SF ELIB - SuUB Bremen
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