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1 Ergebnisse
1
A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Op..:
, In:
2020 IEEE Symposium on VLSI Technology
,
Ali, Tarek
;
Seidel, Konrad
;
Kuhnel, Kati
... - p. 1-2 , 2020
Link:
https://doi.org/10.1109/VLSITechnology18217.2020.92651..
RT T1
2020 IEEE Symposium on VLSI Technology
: T1
A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Optimal Stack Tuning Toward Low Power and High-Speed NVM for Neuromorphic Applications
UL https://suche.suub.uni-bremen.de/peid=ieee-9265111&Exemplar=1&LAN=DE A1 Ali, Tarek A1 Seidel, Konrad A1 Kuhnel, Kati A1 Rudolph, Matthias A1 Czernohorsky, Malte A1 Mertens, Konstantin A1 Hoffmann, Raik A1 Zimmermann, Katrin A1 Muhle, Uwe A1 Muller, Johannes A1 Van Houdt, Jan A1 Eng, Lukas M. YR 2020 SN 2158-9682 K1 Switches K1 Iron K1 Tuning K1 Logic gates K1 Tin K1 Temperature measurement K1 Market research K1 Ferroelectric K1 MFMFIS K1 FeFET K1 synaptic device SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnology18217.2020.9265111 DO https://doi.org/10.1109/VLSITechnology18217.2020.9265111 SF ELIB - SuUB Bremen
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