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1 Ergebnisse
1
Effect of Potassium Oleate as Inhibitor on Copper Chemical ..:
, In:
2020 China Semiconductor Technology International Conference (CSTIC)
,
Yang, Chenghui
;
Niu, Xinhuan
;
Zhou, Jiakai
.. - p. 1-3 , 2020
Link:
https://doi.org/10.1109/CSTIC49141.2020.9282403
RT T1 <cTitle>2020 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>Effect of Potassium Oleate as Inhibitor on Copper Chemical Mechanical Polishing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9282403&Exemplar=1&LAN=DE A1 Yang, Chenghui A1 Niu, Xinhuan A1 Zhou, Jiakai A1 Huo, Zhaoqing A1 Lu, Yanan YR 2020 K1 Planarization K1 Corrosion inhibitors K1 Etching K1 Copper K1 Potassium K1 Slurries K1 Passivation K1 Potassium oleate K1 corrosion inhibitor K1 global planarization K1 removal rate K1 chemical mechanical planarization (CMP) SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC49141.2020.9282403 DO https://doi.org/10.1109/CSTIC49141.2020.9282403 SF ELIB - SuUB Bremen
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