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1 Ergebnisse
1
Mechanism Analysis of Chemical Mechanical Polishing of 4H-S..:
, In:
2020 China Semiconductor Technology International Conference (CSTIC)
,
Zhao, Gaoyang
;
Xu, Aoxue
;
Xu, Fan
... - p. 1-3 , 2020
Link:
https://doi.org/10.1109/CSTIC49141.2020.9282432
RT T1 <cTitle>2020 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>Mechanism Analysis of Chemical Mechanical Polishing of 4H-SiC Wafer</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9282432&Exemplar=1&LAN=DE A1 Zhao, Gaoyang A1 Xu, Aoxue A1 Xu, Fan A1 Feng, Daohuan A1 WeiliLiu A1 Song, Zhitang YR 2020 K1 Planarization K1 Silicon carbide K1 Photonic band gap K1 Electron mobility K1 Silicon K1 Carbon K1 Chemicals K1 4H-SiC K1 Surface State Analysis K1 Chemical Mechanical Polishing SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC49141.2020.9282432 DO https://doi.org/10.1109/CSTIC49141.2020.9282432 SF ELIB - SuUB Bremen
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