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1 Ergebnisse
1
Effects of Electron Beam on Photo Resist Shrinkage and Crit..:
, In:
2020 China Semiconductor Technology International Conference (CSTIC)
,
Bian, Yuyang
;
Sun, Hongxu
;
Wang, Lipeng
... - p. 1-3 , 2020
Link:
https://doi.org/10.1109/CSTIC49141.2020.9282495
RT T1 <cTitle>2020 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>Effects of Electron Beam on Photo Resist Shrinkage and Critical Dimension in SEM Measurement</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9282495&Exemplar=1&LAN=DE A1 Bian, Yuyang A1 Sun, Hongxu A1 Wang, Lipeng A1 Guan, Xijun A1 Guo, Xiaobo A1 Liu, Biqiu A1 Zhang, Cong A1 Huang, Jun A1 Zhang, Yu YR 2020 K1 Semiconductor device measurement K1 Scanning electron microscopy K1 Voltage measurement K1 Current measurement K1 Lithography K1 Resists K1 Size measurement K1 lithography K1 photo resist K1 SEM K1 electron beam K1 shrinkage K1 LER K1 PSD SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC49141.2020.9282495 DO https://doi.org/10.1109/CSTIC49141.2020.9282495 SF ELIB - SuUB Bremen
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