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1 Ergebnisse
1
Overlay mark sub structure design to improve the contrast:
, In:
2020 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Zhang, Libin
;
Lu, Cong
;
Feng, Yaobin
... - p. 1-4 , 2020
Link:
https://doi.org/10.1109/IWAPS51164.2020.9286790
RT T1 <cTitle>2020 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Overlay mark sub structure design to improve the contrast</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9286790&Exemplar=1&LAN=DE A1 Zhang, Libin A1 Lu, Cong A1 Feng, Yaobin A1 Wei, Yayi A1 Su, Xiaojing A1 Ma, Le A1 Dong, Lisong YR 2020 K1 Image recognition K1 Conferences K1 Lithography K1 Metrology K1 Tools K1 Robustness K1 Image based overlay (IBO) K1 metrology K1 sub structure design K1 overlay contrast SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS51164.2020.9286790 DO https://doi.org/10.1109/IWAPS51164.2020.9286790 SF ELIB - SuUB Bremen
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