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Interfacial adhesion of copper-low k interconnects:
, In:
Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461)
,
Andideh, E.
;
Scherban, T.
;
Sun, B.
... - p. 257,258,259 , 2001
Link:
https://doi.org/10.1109/IITC.2001.930077
RT T1
Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461)
: T1
Interfacial adhesion of copper-low k interconnects
UL https://suche.suub.uni-bremen.de/peid=ieee-930077&Exemplar=1&LAN=DE A1 Andideh, E. A1 Scherban, T. A1 Sun, B. A1 Blaine, J. A1 Block, C. A1 Jin, B. YR 2001 K1 Adhesives K1 Dielectric thin films K1 Polymer films K1 Dielectric films K1 Dielectric measurements K1 Energy measurement K1 Mechanical variables measurement K1 Chemical vapor deposition K1 Delamination K1 Atherosclerosis SP 257,258,259 LK http://dx.doi.org/https://doi.org/10.1109/IITC.2001.930077 DO https://doi.org/10.1109/IITC.2001.930077 SF ELIB - SuUB Bremen
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