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Submicron Thickness Characterization of poly-Si thin films ..:

, In: 2020 47th IEEE Photovoltaic Specialists Conference (PVSC),

Chen, Kejun ; LaSalvia, Vincenzo ; Nemeth, William... - p. 2783-2785 , 2020

Link: https://doi.org/10.1109/PVSC45281.2020.9300794

RT 
T1 <cTitle>2020 47th IEEE Photovoltaic Specialists Conference (PVSC)</cTitle>: T1 <Title>Submicron Thickness Characterization of poly-Si thin films on Textured Surfaces by X-ray Diffraction for Minimizing Parasitic Absorption in Poly-Si/SiO2 Passivating Contact Cells</Title>

UL https://suche.suub.uni-bremen.de/peid=ieee-9300794&Exemplar=1&LAN=DE
				
A1 Chen, Kejun
A1 LaSalvia, Vincenzo
A1 Nemeth, William
A1 Theingi, San
A1 Guthrey, Harvey
A1 Hartenstein, Matthew B.
A1 Kale, Abhijit S.
A1 Page, Matthew
A1 Bothwell, Alex
A1 Sites, James
A1 Stradins, Paul
A1 Agarwal, Sumit
A1 Young, David L.
YR 2020
K1 X-ray scattering
K1 Thickness measurement
K1 Passivation
K1 Etching
K1 Renewable energy sources
K1 Scanning electron microscopy
K1 Absorption
K1 silicon solar cell
K1 passivating contacts
K1 parasitic absorption
K1 XRD
K1 cross-sectional scanning electron microscopy
K1 light beam induced current
K1 Quokka simulation
SP 2783
OP 2785
LK http://dx.doi.org/https://doi.org/10.1109/PVSC45281.2020.9300794
DO https://doi.org/10.1109/PVSC45281.2020.9300794
SF ELIB - SuUB Bremen

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