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Buried Power Rail Scaling and Metal Assessment for the 3 nm..:

, In: 2020 IEEE International Electron Devices Meeting (IEDM),

Gupta, A. ; Pedreira, O. Varela ; Tao, Z.... - p. 20.3.1-20.3.4 , 2020

Link: https://doi.org/10.1109/IEDM13553.2020.9371970

RT 
T1 <cTitle>2020 IEEE International Electron Devices Meeting (IEDM)</cTitle>: T1 <Title>Buried Power Rail Scaling and Metal Assessment for the 3 nm Node and Beyond</Title>

UL https://suche.suub.uni-bremen.de/peid=ieee-9371970&Exemplar=1&LAN=DE
				
A1 Gupta, A.
A1 Pedreira, O. Varela
A1 Tao, Z.
A1 Mertens, H.
A1 Radisic, D.
A1 Jourdan, N.
A1 Devriendt, K.
A1 Heylen, N.
A1 Wang, S.
A1 Chehab, B.
A1 Jang, D.
A1 Hellings, G.
A1 Sebaai, F.
A1 Lorant, C.
A1 Teugels, L.
A1 Peter, A.
A1 Chan, BT
A1 Schleicher, F.
A1 Demonie, I.
A1 Marien, P.
A1 Sepulveda, A.
A1 Richard, O.
A1 Nagesh, N.
A1 Lesniewska, A.
A1 Lazzarino, F.
A1 Ryckaert, J.
A1 Morin, P.
A1 Altamirano-Sanchez, E.
A1 Murdoch, G.
A1 Bommels, J.
A1 Demuynck, S.
A1 Na, M. H
A1 Tokei, Z.
A1 Biesemans, S.
A1 Litta, E. Dentoni
A1 Horiguchi, N.
YR 2020
SN 2156-017X
K1 Silicon compounds
K1 Resistance
K1 Annealing
K1 Tin
K1 Business process re-engineering
K1 Electrical resistance measurement
K1 Plugs
SP 20.3.1
OP 20.3.4
LK http://dx.doi.org/https://doi.org/10.1109/IEDM13553.2020.9371970
DO https://doi.org/10.1109/IEDM13553.2020.9371970
SF ELIB - SuUB Bremen

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