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1 Ergebnisse
1
Growth Optimization of Low-Pressure Chemical Vapor Depositi..:
, In:
2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Lei, Wen
;
Wang, Maojun
;
Lin, Xinnan
... - p. 1-3 , 2021
Link:
https://doi.org/10.1109/EDTM50988.2021.9420839
RT T1 <cTitle>2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)</cTitle>: T1 <Title>Growth Optimization of Low-Pressure Chemical Vapor Deposition Silicon Nitride Film</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9420839&Exemplar=1&LAN=DE A1 Lei, Wen A1 Wang, Maojun A1 Lin, Xinnan A1 Liu, Meihua A1 Luo, Jiansheng A1 Jin, Yufeng YR 2021 K1 Performance evaluation K1 Annealing K1 Systematics K1 Films K1 Silicon nitride K1 Production K1 Temperature control K1 LPCVD SiNx films K1 electrical properties K1 gas flow ratio K1 annealing condition K1 gas flow rate SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/EDTM50988.2021.9420839 DO https://doi.org/10.1109/EDTM50988.2021.9420839 SF ELIB - SuUB Bremen
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