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1
Advanced EUV Resist Characterization using Scatterometry an..:
, In:
2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Schmidt, Daniel
;
Petrillo, Karen
;
Breton, Mary
... - p. 1-4 , 2021
Link:
https://doi.org/10.1109/ASMC51741.2021.9435698
RT T1 <cTitle>2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Advanced EUV Resist Characterization using Scatterometry and Machine Learning</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9435698&Exemplar=1&LAN=DE A1 Schmidt, Daniel A1 Petrillo, Karen A1 Breton, Mary A1 Fullam, Jennifer A1 Koret, Roy A1 Turovets, Igor A1 Cepler, Aron YR 2021 SN 2376-6697 K1 Semiconductor device measurement K1 Scanning electron microscopy K1 Machine learning algorithms K1 Radar measurements K1 Spaceborne radar K1 Resists K1 Machine learning K1 EUV K1 resist K1 scatterometry K1 machine learning K1 roughness K1 top loss K1 AFM K1 CDSEM SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC51741.2021.9435698 DO https://doi.org/10.1109/ASMC51741.2021.9435698 SF ELIB - SuUB Bremen
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