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Development of FD-SOI cryogenic amplifier for application t..:

, In: 2021 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA),

Takeuchi, Y. ; Kim, S.H. ; Iida, T.... - p. 1-2 , 2021

Link: https://doi.org/10.1109/VLSI-TSA51926.2021.9440090

RT 
T1 <cTitle>2021 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)</cTitle>: T1 <Title>Development of FD-SOI cryogenic amplifier for application to STJ readout in COBAND project</Title>

UL https://suche.suub.uni-bremen.de/peid=ieee-9440090&Exemplar=1&LAN=DE
				
A1 Takeuchi, Y.
A1 Kim, S.H.
A1 Iida, T.
A1 Asano, C.
A1 Wakasa, R.
A1 Maekawa, G.
A1 Nakahara, S.
A1 Yamane, R.
A1 Ikeda, H.
A1 Wada, T.
A1 Nagase, K.
A1 Matsuura, S.
A1 Arai, Y.
A1 Kurachi, I.
A1 Hazumi, M.
A1 Yoshida, T.
A1 Mima, S.
A1 Kiuchi, K.
A1 Ishino, H.
A1 Kibayashi, A.
A1 Kato, Y.
A1 Fujii, G.
A1 Shiki, S.
A1 Ukibe, M.
A1 Ohkubo, M.
A1 Kawahito, S.
A1 Ramberg, E.
A1 Rubinov, P.
A1 Sergatskov, D.
A1 Kim, S.B.
A1 Kim, Y.H.
A1 Lee, H.J.
YR 2021
K1 Spectroscopy
K1 Neutrino sources
K1 Finite impulse response filters
K1 Shape
K1 Wavelength measurement
K1 Cryogenics
K1 Very large scale integration
SP 1
OP 2
LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA51926.2021.9440090
DO https://doi.org/10.1109/VLSI-TSA51926.2021.9440090
SF ELIB - SuUB Bremen

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