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Characteristics of argon-ion-implanted amorphous-InGaZnO:
, In:
2021 28th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
,
Yasuta, K.
;
Ui, T.
;
Ikeda, T.
... - p. 77-80 , 2021
Link:
https://doi.org/10.23919/AM-FPD52126.2021.9499156
RT T1 <cTitle>2021 28th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)</cTitle>: T1 <Title>Characteristics of argon-ion-implanted amorphous-InGaZnO</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9499156&Exemplar=1&LAN=DE A1 Yasuta, K. A1 Ui, T. A1 Ikeda, T. A1 Matsuo, D. A1 Sakai, T. A1 Dohi, S. A1 Setoguchi, Y. A1 Takahashi, E. A1 Andoh, Y. A1 Tatemichi, J. YR 2021 K1 Resistance K1 Wet etching K1 Conferences K1 Process control K1 Glass K1 Plasma measurements K1 Ions SP 77 OP 80 LK http://dx.doi.org/https://doi.org/10.23919/AM-FPD52126.2021.9499156 DO https://doi.org/10.23919/AM-FPD52126.2021.9499156 SF ELIB - SuUB Bremen
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