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1 Ergebnisse
1
Improving Ruthenium Polishing Through the use of Ceria Abra..:
, In:
2020 IEEE International Interconnect Technology Conference (IITC)
,
Netzband, Christopher
;
Dunn, Kathleen
- p. 70-72 , 2020
Link:
https://doi.org/10.1109/IITC47697.2020.9515659
RT T1
2020 IEEE International Interconnect Technology Conference (IITC)
: T1
Improving Ruthenium Polishing Through the use of Ceria Abrasives
UL https://suche.suub.uni-bremen.de/peid=ieee-9515659&Exemplar=1&LAN=DE A1 Netzband, Christopher A1 Dunn, Kathleen YR 2020 SN 2380-6338 K1 Silicon compounds K1 Ruthenium K1 Films K1 Conferences K1 Metals K1 Surface roughness K1 Abrasives K1 CMP K1 AFM K1 ceria K1 ruthenium K1 silica SP 70 OP 72 LK http://dx.doi.org/https://doi.org/10.1109/IITC47697.2020.9515659 DO https://doi.org/10.1109/IITC47697.2020.9515659 SF ELIB - SuUB Bremen
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