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1 Ergebnisse
1
Contour Based Solution For Identifying Mask Induced Error:
, In:
2021 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Yu, Yinsheng
;
Liu, Guoping
;
Zhao, Hongwen
... - p. 1-3 , 2021
Link:
https://doi.org/10.1109/IWAPS54037.2021.9671258
RT T1 <cTitle>2021 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Contour Based Solution For Identifying Mask Induced Error</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9671258&Exemplar=1&LAN=DE A1 Yu, Yinsheng A1 Liu, Guoping A1 Zhao, Hongwen A1 Zhou, Kan A1 Li, Yuhui A1 Zhou, Wenzhan A1 Zhang, Yu A1 Wan, Qijian A1 Chen, Ao A1 Du, Chunshan A1 Zhang, Liguo A1 Fenger, Germain YR 2021 K1 Semiconductor device modeling K1 Industries K1 Conferences K1 Lithography K1 Inspection K1 Foundries K1 Feeds K1 Mask K1 Process Window K1 Hot spot SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS54037.2021.9671258 DO https://doi.org/10.1109/IWAPS54037.2021.9671258 SF ELIB - SuUB Bremen
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