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1 Ergebnisse
1
Influence of Wall Conditioning State on AR Plasma Emission ..:
, In:
2020 IEEE International Conference on Plasma Science (ICOPS)
,
Song, Jaemin
;
Kim, Jongsik
;
Kim, Dae Chul
... - p. 95-95 , 2020
Link:
https://doi.org/10.1109/ICOPS37625.2020.9717724
RT T1
2020 IEEE International Conference on Plasma Science (ICOPS)
: T1
Influence of Wall Conditioning State on AR Plasma Emission in a Processing Chamber
UL https://suche.suub.uni-bremen.de/peid=ieee-9717724&Exemplar=1&LAN=DE A1 Song, Jaemin A1 Kim, Jongsik A1 Kim, Dae Chul A1 Song, Mi-Young A1 Yoon, Jung-Sik A1 Son, Sung-Hyun A1 Kwon, Ji-Won A1 Ryu, Sangwon A1 Kim, Gon-Ho YR 2020 SN 2576-7208 K1 Radio frequency K1 Sensitivity K1 Stimulated emission K1 Optical variables measurement K1 Tunneling K1 Insulators K1 Solids SP 95 OP 95 LK http://dx.doi.org/https://doi.org/10.1109/ICOPS37625.2020.9717724 DO https://doi.org/10.1109/ICOPS37625.2020.9717724 SF ELIB - SuUB Bremen
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