I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
High-Peformance BEOL-Compatible Atomic-Layer-Deposited In2O..:
, In:
2021 IEEE International Electron Devices Meeting (IEDM)
,
Lin, Z.
;
Si, M.
;
Luo, Y.-C.
... - p. 17.4.1-17.4.4 , 2021
Link:
https://doi.org/10.1109/IEDM19574.2021.9720652
RT T1
2021 IEEE International Electron Devices Meeting (IEDM)
: T1
High-Peformance BEOL-Compatible Atomic-Layer-Deposited In2O3 Fe-FETs Enabled by Channel Length Scaling down to 7 nm: Achieving Performance Enhancement with Large Memory Window of 2.2 V, Long Retention > 10 years and High Endurance > 108 Cycles
UL https://suche.suub.uni-bremen.de/peid=ieee-9720652&Exemplar=1&LAN=DE A1 Lin, Z. A1 Si, M. A1 Luo, Y.-C. A1 Lyu, X. A1 Charnas, A. A1 Chen, Z. A1 Yu, Z. A1 Tsai, W. A1 McIntyre, P. C. A1 Kanjolia, R. A1 Moinpour, M. A1 Yu, S. A1 Ye, P. D. YR 2021 SN 2156-017X K1 Performance evaluation K1 Zirconium K1 Photonic band gap K1 Nonvolatile memory K1 Atomic layer deposition K1 Memory management K1 Random access memory SP 17.4.1 OP 17.4.4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM19574.2021.9720652 DO https://doi.org/10.1109/IEDM19574.2021.9720652 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)