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1 Ergebnisse
1
Understanding Hot Carrier Reliability in FinFET Technology ..:
, In:
2021 IEEE International Electron Devices Meeting (IEDM)
,
Wang, Runsheng
;
Sun, Zixuan
;
Liu, Yue-Yang
... - p. 31.2.1-31.2.4 , 2021
Link:
https://doi.org/10.1109/IEDM19574.2021.9720674
RT T1
2021 IEEE International Electron Devices Meeting (IEDM)
: T1
Understanding Hot Carrier Reliability in FinFET Technology from Trap-based Approach
UL https://suche.suub.uni-bremen.de/peid=ieee-9720674&Exemplar=1&LAN=DE A1 Wang, Runsheng A1 Sun, Zixuan A1 Liu, Yue-Yang A1 Yu, Zhuoqing A1 Wang, Zirui A1 Jiang, Xiangwei A1 Huang, Ru YR 2021 SN 2156-017X K1 Degradation K1 Electron traps K1 Temperature dependence K1 Microscopy K1 Hot carriers K1 Predictive models K1 FinFETs SP 31.2.1 OP 31.2.4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM19574.2021.9720674 DO https://doi.org/10.1109/IEDM19574.2021.9720674 SF ELIB - SuUB Bremen
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