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1 Ergebnisse
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Enhanced wafer level variability improvement by customized ..:
, In:
2021 2nd International Conference on Electronics, Communications and Information Technology (CECIT)
,
Mu, Kejun
;
Wang, Chuyu
;
Zhang, Zhongjie
... - p. 555-559 , 2021
Link:
https://doi.org/10.1109/CECIT53797.2021.00104
RT T1 <cTitle>2021 2nd International Conference on Electronics, Communications and Information Technology (CECIT)</cTitle>: T1 <Title>Enhanced wafer level variability improvement by customized wafer dose patterning by shot in DRAM</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9742104&Exemplar=1&LAN=DE A1 Mu, Kejun A1 Wang, Chuyu A1 Zhang, Zhongjie A1 Tang, Jifeng A1 Yang, Andy A1 Li, Xiong A1 Wang, Jianping A1 Wu, Blacksmith A1 Cao, Kanyu YR 2021 K1 Mass production K1 Ion implantation K1 Random access memory K1 Throughput K1 Information and communication technology K1 DRAM K1 shot-to-shot variability K1 SuperScan SP 555 OP 559 LK http://dx.doi.org/https://doi.org/10.1109/CECIT53797.2021.00104 DO https://doi.org/10.1109/CECIT53797.2021.00104 SF ELIB - SuUB Bremen
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