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1 Ergebnisse
1
Si Metal-Oxide-Semiconductor and Si/SiGe Heterostructure Qu..:
, In:
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)
,
Wu, Yu-Jui
;
Chiang, Chih-Ying
;
Tsao, Hung-Yu
... - p. 1-2 , 2022
Link:
https://doi.org/10.1109/VLSI-TSA54299.2022.9770981
RT T1 <cTitle>2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)</cTitle>: T1 <Title>Si Metal-Oxide-Semiconductor and Si/SiGe Heterostructure Quantum Dots</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9770981&Exemplar=1&LAN=DE A1 Wu, Yu-Jui A1 Chiang, Chih-Ying A1 Tsao, Hung-Yu A1 Li, Tsung-Ying A1 Wang, Tz-Ming A1 Lin, Min-Jui A1 Liu, Chia-You A1 Yeh, Ching-Chen A1 Yang, Cheng-Hsueh A1 Liang, Chi-Te A1 Li, Jiun-Yun YR 2022 K1 Electric potential K1 Quantum dots K1 Logic gates K1 Very large scale integration K1 Capacitance K1 Silicon K1 Stability analysis SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA54299.2022.9770981 DO https://doi.org/10.1109/VLSI-TSA54299.2022.9770981 SF ELIB - SuUB Bremen
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