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Characterization of Double HfZrO2 based FeFET toward Low-Vo..:

, In: 2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA),
Lou, Z.-F. ; Liao, C.-Y. ; Hsiang, K.-Y.... - p. 1-2 , 2022
Link: https://doi.org/10.1109/VLSI-TSA54299.2022.9771012