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1 Ergebnisse
1
Dual Gate Oxide CMOS Process on 4H-SiC:
, In:
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)
,
Tsui, Bing-Yue
;
Hung, Chia-Lung
;
Tsai, Te-Kai
... - p. 1-2 , 2022
Link:
https://doi.org/10.1109/VLSI-TSA54299.2022.9771044
RT T1
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)
: T1
Dual Gate Oxide CMOS Process on 4H-SiC
UL https://suche.suub.uni-bremen.de/peid=ieee-9771044&Exemplar=1&LAN=DE A1 Tsui, Bing-Yue A1 Hung, Chia-Lung A1 Tsai, Te-Kai A1 Lin, Li-Jung A1 Wang, Ting-Wei A1 Chen, Po-Hung YR 2022 K1 Ring oscillators K1 MOSFET K1 Low voltage K1 Silicon carbide K1 High-voltage techniques K1 Logic gates K1 MOSFET circuits SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA54299.2022.9771044 DO https://doi.org/10.1109/VLSI-TSA54299.2022.9771044 SF ELIB - SuUB Bremen
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