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1
Root Cause Identification and Mitigation of Polysilicon CMP..:
, In:
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
McCabe, Russell
;
Chaudhuri, Ritesh Ray
;
Spangler, Samantha
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/ASMC54647.2022.9792484
RT T1
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Root Cause Identification and Mitigation of Polysilicon CMP Underpolish Increase in DRAM Manufacturing
UL https://suche.suub.uni-bremen.de/peid=ieee-9792484&Exemplar=1&LAN=DE A1 McCabe, Russell A1 Chaudhuri, Ritesh Ray A1 Spangler, Samantha A1 Heller, Russ A1 Tahraoui, Ahmed A1 Synder, Emmett A1 Simpson, William A1 Frachel, Michael A1 Martin, Glen YR 2022 SN 2376-6697 K1 Systematics K1 Random access memory K1 Semiconductor device manufacture K1 Metrology K1 Product design K1 Manufacturing K1 Quality assessment K1 CMOS K1 Variation Reduction K1 Yield Improvement SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/ASMC54647.2022.9792484 DO https://doi.org/10.1109/ASMC54647.2022.9792484 SF ELIB - SuUB Bremen
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