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1 Ergebnisse
1
In-situ Cleaning of Post-etch Byproducts by Manipulating De..:
, In:
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Yang, Ki Dong
;
Park, Hanbit
;
Lee, Joonho H.
... - p. 1-4 , 2022
Link:
https://doi.org/10.1109/ASMC54647.2022.9792508
RT T1
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
In-situ Cleaning of Post-etch Byproducts by Manipulating Dechucking Environment Gas in Silicon Etch Process
UL https://suche.suub.uni-bremen.de/peid=ieee-9792508&Exemplar=1&LAN=DE A1 Yang, Ki Dong A1 Park, Hanbit A1 Lee, Joonho H. A1 Hwang, Eunji A1 Jeong, Jiwoo A1 Kwon, Sangku A1 Kim, Kihyun A1 Jeong, Jaein A1 Han, Eunyoung A1 Kim, Young Jeong A1 Kim, Joong Jung YR 2022 SN 2376-6697 K1 Performance evaluation K1 Spectroscopy K1 Stimulated emission K1 Semiconductor device manufacture K1 Ions K1 Silicon K1 Cleaning K1 dry etching process K1 reaction byproducts K1 in-situ cleaning K1 interface trap SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC54647.2022.9792508 DO https://doi.org/10.1109/ASMC54647.2022.9792508 SF ELIB - SuUB Bremen
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