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1 Ergebnisse
1
Effects of Gate Metal Work Function and Line Edge Roughness..:
, In:
2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Wang, Xinhe
;
Gao, Bin
;
Tang, Jianshi
... - p. 387-389 , 2022
Link:
https://doi.org/10.1109/EDTM53872.2022.9798275
RT T1 <cTitle>2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)</cTitle>: T1 <Title>Effects of Gate Metal Work Function and Line Edge Roughness on the Variability of Junctionless Field-Effect Transistor</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9798275&Exemplar=1&LAN=DE A1 Wang, Xinhe A1 Gao, Bin A1 Tang, Jianshi A1 Zhang, Zhigang A1 Wu, Huaqiang A1 Qian, He YR 2022 K1 Atomic measurements K1 Performance evaluation K1 Atomic force microscopy K1 Solid modeling K1 Three-dimensional displays K1 Force K1 Metals K1 Junctionless FET K1 WFV K1 LER K1 3D TCAD SP 387 OP 389 LK http://dx.doi.org/https://doi.org/10.1109/EDTM53872.2022.9798275 DO https://doi.org/10.1109/EDTM53872.2022.9798275 SF ELIB - SuUB Bremen
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