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State of the Art and Future Perspectives in III-V Nanometer..:
, In:
2022 IEEE VLSI Device Circuit and System (VLSI DCS)
,
Dey, Saswati
;
Biswas, Kalyan
;
Sarkar, Angsuman
- p. 170-175 , 2022
Link:
https://doi.org/10.1109/VLSIDCS53788.2022.9811490
RT T1
2022 IEEE VLSI Device Circuit and System (VLSI DCS)
: T1
State of the Art and Future Perspectives in III-V Nanometer-Scale MOSFETs
UL https://suche.suub.uni-bremen.de/peid=ieee-9811490&Exemplar=1&LAN=DE A1 Dey, Saswati A1 Biswas, Kalyan A1 Sarkar, Angsuman YR 2022 K1 Radio frequency K1 Performance evaluation K1 Very large scale integration K1 Logic gates K1 FinFETs K1 Indium gallium arsenide K1 Silicon K1 InGaAs K1 III-V semiconductor material K1 nonplanar FINFET K1 DG MOSFET SP 170 OP 175 LK http://dx.doi.org/https://doi.org/10.1109/VLSIDCS53788.2022.9811490 DO https://doi.org/10.1109/VLSIDCS53788.2022.9811490 SF ELIB - SuUB Bremen
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